![Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S0169433202000314-gr33.jpg)
Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect
![Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S0169433202000314-gr31.jpg)
Dielectric film etching in semiconductor device manufacturing: Development of SiO2 etching and the next generation plasma reactor - ScienceDirect
![Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas: Journal of Vacuum Science & Technology A: Vol 34, No 4 Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas: Journal of Vacuum Science & Technology A: Vol 34, No 4](https://avs.scitation.org/action/showOpenGraphArticleImage?doi=10.1116/1.4949570&id=images/medium/1.4949570.figures.f1.gif)